Patent application US 20140239446 A1 on "Fractal Structures For Fixed MEMS Capacitors" was awarded a USA patent. We demonstrate RF microelectromechanical systems (MEMS) fractal capacitors possessing the highest reported self-resonant frequencies (beyond 20GHz) in the PolyMUMPS process with a quality factor up to 28. Additional benefits include suppressing residual stress warping, eliminating the need for etching holes, and reducing parasitics without any additional fabrication intervention. This work was published at the IEEE/ASME Journal of Microelectromechanical Systems (JMEMS). The paper is titled "RF MEMS Fractal Capacitors with High Self Resonant Frequencies".