About Vishal Khandelwal Vishal Khandelwal Ph.D. Student, Electrical and Computer Engineering Vishal Khandelwal is a Ph.D. candidate in the Advanced Semiconductor Laboratory in KAUST since August 2020. He obtained his master’s degree in physics from the Indian Institute of Technology (IIT), Jodhpur in 2020, and a bachelor’s degree in physics from the University of Delhi in 2018. His research focuses on epitaxy and fabrication of β-Ga2O3 devices and electronics for extreme environment operations. He is the author/co-author of 6 peer-reviewed journal papers and 3 international conference papers. Research Interests Vishal’s research interest includes Large Area fabrication of the Articles Related News April 2026 Gallium oxide electronics withstand extreme cold 1 min read · Mon, Apr 27 2026 News Clip News advanced semiconductors Gallium oxide Robust semiconductor enables devices to operate close to absolute zero, with potential applications in space missions and quantum computing. August 2023 Tough memory device aims for space missions 2 min read · Tue, Aug 15 2023 News Gallium oxide offers resistance to radiation and high temperatures, and could be used for data storage and computing in extreme conditions. August 2020 Meet KAUST prospective student: Vishal Khandelwal 1 min read · Thu, Aug 27 2020 News optoelectronic devices Vishal Khandelwal is a physics graduate from India. He obtained his master’s degree from the Indian Institute of Technology, Jodhpur, and his bachelor’s degree from the University of Delhi, India. Vishal will join KAUST in the fall of 2020 as a Ph.D. candidate and member of the Advanced Semiconductor Laboratory under the supervision of Professor Xiaohang Li.
Gallium oxide electronics withstand extreme cold 1 min read · Mon, Apr 27 2026 News Clip News advanced semiconductors Gallium oxide Robust semiconductor enables devices to operate close to absolute zero, with potential applications in space missions and quantum computing.
Tough memory device aims for space missions 2 min read · Tue, Aug 15 2023 News Gallium oxide offers resistance to radiation and high temperatures, and could be used for data storage and computing in extreme conditions.
Meet KAUST prospective student: Vishal Khandelwal 1 min read · Thu, Aug 27 2020 News optoelectronic devices Vishal Khandelwal is a physics graduate from India. He obtained his master’s degree from the Indian Institute of Technology, Jodhpur, and his bachelor’s degree from the University of Delhi, India. Vishal will join KAUST in the fall of 2020 as a Ph.D. candidate and member of the Advanced Semiconductor Laboratory under the supervision of Professor Xiaohang Li.
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