KAUST researchers Dr. Islam Ashry, Dr. Chun Hong Kang and Professor Boon S. Ooi were part of a team that recently won the 2022 International Date Palm Innovative Technology Excellence Prize from the National Center for Palm and Dates (NCPD).
KAUST Professor of Electrical and Computer Engineering (ECE), Tareq Al-Naffouri, has been awarded the 2022 Abdul Hameed Shoman Foundation Arab Researchers Award in the Agriculture and Technology field. The award honors research that significantly contributes to solving local, regional, and global problems.

By David Murphy
 
The research work of KAUST Ph.D. student Rawan Alghamdi was announced as the runner-up prize winner in the IEEE Competition on Non-Terrestrial Networks (NTN) Beyond 5G and 6G, as part of the "Connecting the World from the Skies" Forum. 

Asmaa Abdallah, a postdoctoral research fellow at KAUST Communication and Computing Systems Lab (CCSL), has been named a Leading Innovator under 35 in the MENA region by MIT Technology Review Arabia.
KAUST Professor of Electrical and Computer Engineering Boon S. Ooi was recently named as an Institute of Electrical and Electronics Engineers (IEEE) Fellow, effective January 1, 2023. Professor Ooi was elected for his "contributions to broadband light emitters and visible light communications," the IEEE stated.
Nour Kouzayha, a postdoctoral research fellow based in the KAUST Information Science Lab (ISL), recently won the Best Poster Award at the Technology Innovation Institute’s (TII) Abu Dhabi 6G Summit 2022. Dr. Kouzayha received the award for her poster titled "Coverage and Mobility Analysis of Aerial Users in Integrated HAPS-Ground Wireless Networks." 
We studied the electrochemical property of nitride semiconductors. It was expected to be the three-electron nature so far. However, we have found out that it is the six-electron nature. The six-electron nature was observed in different solutions and pH levels, resulting in a universal phenomenon for nitride semiconductors. The result will be useful to control electrochemical etching and other treatments to achieve their precise control.