PhD Degree,
Electrical and Computer Engineering
Thursday, September 12, 2019, 09:30
- 11:00
Building 3, Level 5, Room 5209
Contact Person
This thesis aims to investigate the microscopic characteristics of the nanowires and expand on the possibility of using transparent amorphous substrate for III-nitride nanowire devices. In this work, we performed material growth, characterization, and device fabrication of III-nitride nanowires grown using molecular beam epitaxy on unconventional substrates including silicon substrates and fused silica substrates. We also investigated the effect of various nucleation layers on the morphology and quality of the nanowires.